Characteristics of Ni-based ohmic contacts on n-type 4H-SiC using different annealing methods
نویسندگان
چکیده
Nickel is an excellent ohmic-contact metal on 4H-SiC. This paper discusses the formation mechanism of nickel ohmic contact 4H-SiC by assessing electrical properties and microstructural change. Under high-temperature annealing, phase nickel-silicon compound can be observed with X-ray diffraction, resistance also changes. A comparative experiment was designed to use diffraction energy-dispersive spectroscopy clarify difference material composition elemental analysis between samples prepared using pulsed laser annealing rapid thermal annealing. It found that more Ni2Si carbon vacancies formed at interface in sample resulting a better characteristic.
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1.—Department of Physics and Astronomy, Youngstown State University, Youngstown, OH 44555, USA. 2.—Department of Physics, Georgia Southern University, Statesboro, GA 30460, USA. 3.—Department of Physics, Auburn University, Auburn, AL 36849, USA. 4.—Present address: Department of Materials Science and Engineering, University of Illinois at Urbana– Champaign, Urbana, IL 61801, USA. 5.—e-mail: tno...
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ژورنال
عنوان ژورنال: Nanotechnology and Precision Engineering
سال: 2021
ISSN: ['2589-5540', '1672-6030']
DOI: https://doi.org/10.1063/10.0003763